Ibsen news
2004-06-18 | 5 min read
Patent awarded for production technique of high-volume, sub-micron period gratings
[h5]Press Release - Copenhagen, June 18th, 2004 [/h5] Ibsen Photonics has been awarded patent for production technique of high-volume, sub-micron period gratings Near Field Holography (NFH) process technology improves manufacturability of gratings in wafer based integrated optical components Ibsen Photonics, a leading supplier of holographic Phase masks, transmission diffraction gratings and DWDM monitors based on diffraction gratings, today announced that it has been granted United States Patent # 6,693,701, titled "Method and Apparatus for Diffractive Transfer of Grating Mask". This technology allows manufacturers to print sub-micron grating periods by further advancing the manufacturability provided by NFH technology which involves replicating
2003-09-16 | 4 min read
Relocation of Phase mask manufacturing and process optimisation at Ibsen Photonics
[h5]Press Release - Copenhagen, September 16, 2003 [/h5] FBG manufacturers benefit from relocation of Phase mask manufacturing and process optimisation at Ibsen Photonics Ibsen Photonics today announced that after a thorough run-in period the manufacturing of their holographic Phase masks has now been successfully relocated to Ibsen Photonics 1.300 sq.m. (approx. 14.000 sq.ft.) cleanroom facility in Farum, Denmark. "We have always produced our Phase masks in our own clean room, but we can clearly see improvement in defect counts on the Phase masks over the last months caused by the relocation of the manufacturing line to our new class 10