Semiconductor manufacturing
The semiconductor industry is one of the most demanding environments for precision measurement, where even the smallest deviation in process parameters can affect device performance and yield. Metrology plays a central role in semiconductor manufacturing by ensuring that every layer, feature, and material meets strict specifications. As devices continue to shrink to nanometer scales and architectures become more complex, reliable measurement tools are indispensable for maintaining quality and competitiveness.
Optical spectroscopy is widely used in semiconductor metrology because it offers non‑destructive, highly sensitive, and versatile measurement capabilities. Unlike mechanical or contact based techniques, optical methods can probe materials and processes in real time without interrupting production. This is particularly valuable in high volume manufacturing, where speed and accuracy directly translate into cost savings and improved yield.
One of the most important advantages of optical spectroscopy is its ability to provide immediate feedback during fabrication. Compact spectrometers integrated into production lines continuously monitor processes, enabling engineers to detect deviations early and make rapid adjustments. This real time monitoring reduces waste, minimizes downtime, and ensures consistent product quality.
Typical applications of optical spectroscopy in semiconductors include measuring critical dimensions to ensure device performance, thin film characterization for thickness and uniformity, and endpoint detection in plasma processes to prevent over processing. It also supports process control by monitoring chemical compositions and plasma states for stability and reproducibility.
Optical Critical Dimensions (OCD)
Optical Critical Dimension (OCD) spectroscopy, also known as optical scatterometry, is a non‑destructive, high‑throughput metrology technique widely used in semiconductor fabs. The technique uses a UV-VIS spectrometer to collect the reflected light spectra from patterned wafer surfaces, and these signals are analyzed through modeling to determine feature dimensions and material properties.
Thin films
In semiconductor manufacturing, the thickness and refractive index of thin films are measured using techniques such as ellipsometry and spectral reflectometry. Typically, spectrometers operating across the UV‑VIS‑NIR range are employed to collect spectral data. This data is then analyzed with optical models, which allow engineers to extract key film properties and ensure that the deposited layers meet design specifications.
Endpoint detection
Semiconductor manufacturing relies on plasma etching, where endpoint detection ensures accuracy and yield. Optical metrology methods such as optical emission spectroscopy (OES), spectral reflectometry, and laser interferometry, are used to monitor the etching progress. The spectrometers used are typically covering the UV-VIS range (190–1100 nm), with high resolution, dynamic range, and signal-to-noise as well as low stray light.
Process control
Processes in semiconductor manufacturing like wet chemistry requires tight control to ensure consistent etching and cleaning. UV-VIS, NIR, FTIR, and Raman spectroscopy are typically employed to monitor bath composition, detect contaminants, and track molecular changes.
How Ibsen supports semiconductor manufacturing
Ibsen Photonics deliver OEM spectrometers for integration into metrology tools used inside semiconductor fabs. Our expertise spans spectrometers for UV‑VIS, Raman, and NIR spectroscopy. We specialize in customization, tailoring spectrometer designs to meet the specific requirements of tool builders, whether that means optimizing throughput, enhancing sensitivity, or adapting to compact footprints. This flexibility enables instruments that meet the demanding standards of semiconductor production.
Ibsen’s spectrometers are built on our proprietary transmission gratings, etched directly into fused silica for superior efficiency and minimal stray light. Covering wavelengths from 175 nm to 2.5 μm, our designs combine high signal‑to‑noise ratio, environmental stability, and compact form factors. With no moving parts and low sensitivity to environmental influences, our spectrometers provide long‑term stability for robust measurements.
We understand that volume manufacturing of application‑specific spectrometers is very different from building single scientific instruments. As an ISO 9001 and 13485 certified manufacturer, we bring decades of experience in scaling production for OEM customers. Our emphasis on consistent quality, 100% outgoing inspection, and environmental qualification ensures reliable performance across every unit.
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