Phase masks for 800 nm fs inscription

 

Ibsen has introduced a new Phase mask product. We are pleased to present that we have developed a technology that allows for the 0. order suppression of Phase masks optimized for 800 nm TE illumination. With 1000-1100 nm period Phase masks, this has not previously been possible.

The development project included a trial production lot of a sample Phase mask of this type, with the following specs:

Engineering Sample Phase mask specifications:

A limited number of this Phase mask is available for immediate ...

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Phase mask spring cleaning offer!

Dear Reader,

PM and microscope

Spring is upon us (at least in the northern hemisphere), and Ibsen has recently qualified a brand new cleaning line in our Phase mask manufacturing.

In combination with our 100% class 10 clean room environment, Ibsen Phase masks represent the highest standard in low-defect level Phase masks. Even the cleanest Phase mask will, however, get contaminated in use. Phase mask contamination can ...

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