Phase masks for 800 nm fs inscription

 

Ibsen has introduced a new Phase mask product. We are pleased to present that we have developed a technology that allows for the 0. order suppression of Phase masks optimized for 800 nm TE illumination. With 1000-1100 nm period Phase masks, this has not previously been possible.

The development project included a trial production lot of a sample Phase mask of this type, with the following specs:

+1/-1 order Phase mask principle sketch

+1/-1 order Phase mask principle sketch

Engineering Sample Phase mask specifications:

  • Ibsen Uniform Phase mask, +/- 1. order principle
  • Grating period: 1070.00 nm
  • Grating size: 20 mm x 10 mm
  • Substrate size: 30 mm x 25 mm
  • Optimized for 800 nm TE illumination
  • 0. order: < 4%

A limited number of this Phase mask is available for immediate delivery, and are offered at the price of EUR 3.495,- per mask.

Ibsen also offers production of custom Phase masks optimized for 800 nm TE illumination – inquire with your required parameters to receive a quotation.

 

Click here for more information about our phase masks

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