Spectrometer grating for 415-957 nm

Fused silica transmission grating technology enables high resolution, high efficiency gratings that are ideal for compact spectrometers.

Features and benefits

  • Lithographic or holographic stepper patterning technology combines the highest quality of patterning with the reproducibility and cost level of replicated gratings

  • 100% Fused silica gratings provide unbeatable temperature stability, environmental tolerance and power damage threshold – also in the UV

  • Grating resolutions up to ~3000 l/mm

  • High diffraction efficiency with high dispersion

  • Low polarization dependence (PDL) over broad spectral ranges

  • Combined wavelength dispersion and folding elements

  • Multiple prototyping, small and high volume production technologies

  • Class 10 cleanroom production ensures low noise and high cleanliness – as well as a controlled environment for our metrology capabilities

  • Extensive grating metrology including proprietary period measurement systems, a versatile diffraction efficiency measurement system, a high resolution defect inspection system as well as AFM/SEM ensuring that agreed upon specifications are fulfilled

Parameter Specification
Grating technologySurface relief, Etched transmission gratings
Grating resolution1105 lines / mm
Illumination wavelength range415 nm - 957 nm
Angle of incidence17.3 degrees
MaterialFused silica and high-power, dielectric AR coating materials
Chip size9.1 mm x 12 mm
Grating area8.1 mm x 8.1 mm
Chip thickness 0.625 mm

We are happy to discuss your requirements for customized gratings. Use the forms at the bottom of the page to specify your requirements for a discussion or quotation.


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