Production optimization of narrow pitch grating fabrication using near-field holographic technique
Abstract: The fabrication of a narrow pitch grating for optical communication has been optimized using the Near Field Holographic technique. Grating phase mask with pitch period of 240 nm has been used to produce grating patterns in photo resist on Si substrates using the i-line of a conventional mercury lamp as exposure light. Control of duty cycle and uniformity of the near-field holographic gratings have been demonstrated. The technique as a fabrication tool is discussed.