Cost-effective fabrication of low period gratings, typically in high refractive index materials
Low-cost production of gratings on planar wafers can be accomplished by use of the Nearfield Holography (NFH) technique, which employs a special type of phase mask. The phase mask is made for easy use in a specially modified mask aligner (commercially available from Süss MicroTec) with a conventional UV source as illumination. This technology has distinct production advantages over grating fabrication by direct holography or direct e-beam technology. In addition of fabrication of gratings on semiconductor DFB lasers, the technique is also advantageous in a number of other fine-pitch applications within the telecommunications and sensor industries.
Sample applications include:
It is imperative that the Phase mask is accurate, uniform and defect-free. Through scientific principles and constants of nature, our fabrication process ensures absolute pitch accuracy.
All our production processes take place in a cleanroom environment, giving you high yield through nearly defect-free Phase masks. Phase masks and the NFH technology are thus suitable for mass production of distributed feedback (DFB) lasers.
Other important features of our line of 0/-1 order Phase masks are:
Phase mask pitches down to 260 nm
Period accuracy and uniformity better than 0.01 nm
Inherently free of stitching errors
Optimized for the required illumination wavelength
Phase mask parameters are individually specified – including unique serial number – on each phase mask