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Phase masks for 800 nm fs inscription


  Ibsen has introduced a new Phase mask product. We are pleased to present that we have developed a technology that allows for the 0. order suppression of Phase masks optimized for 800 nm TE illumination. With 1000-1100 nm period Phase masks, this has not previously been possible. The development project included a trial production lot of a sample Phase mask of this type, with the following specs: +1/-1 order Phase mask principle sketch Engineering Sample Phase mask specifications: Ibsen Uniform Phase mask, +/- 1. order principle Grating period: 1070.00 nm Grating size: 20 mm x 10 mm Substrate size:

Phase mask spring cleaning offer!


Dear Reader, Spring is upon us (at least in the northern hemisphere), and Ibsen has recently qualified a brand new cleaning line in our Phase mask manufacturing. In combination with our 100% class 10 clean room environment, Ibsen Phase masks represent the highest standard in low-defect level Phase masks. Even the cleanest Phase mask will, however, get contaminated in use. Phase mask contamination can occur through residue on the fiber that is transferred onto the Phase mask during the writing process, and is also dependent on care of handling as well as environment cleanliness. Effective and regular Phase mask cleaning can