Grating Foundry Services
Ibsen offers a variety of grating foundry services
Holographic or Lithographuc pattening and RIE/ICP etch
We offer pattening and etch of grating structures on fused silica or other materials, applying Ibsen’s unique know-how:
- 100% Class 10 cleanroom environment
- Grating period accuracy and uniformity of +/- 0.01 nm
- Substrate / wafer size capabilities up to 6″ (150 mm)
- Grating area definition possibilities
- RIE etching services combined with the grating patterning service
We have holographic stepper and lithography based production equipment for cost-effective, high volume production of gratings with sizes up to approx. 25 mm x 20 mm, and we have flexible, low volume holographic production equipment for gratings up to 120 mm size. A couple of samples of gratings patterned in photoresist are shown below.
Further Information and Ordering
For further information or to request a quotation pleae contact us at email@example.com.