Grating Foundry Service

Ibsen offers grating foundry services deploying three technologies:

Holographic exposure

This production technology employs widely used 2-beam interferometric patterning on an optical table, but spiced with the features of Ibsen’s unique know-how:

  • 100% Class 10 cleanroom environment
  • Grating period accuracy and uniformity of +/- 0.01 nm
  • Substrate / wafer size capabilities up to 6″ (150 mm)
  • Grating area definition possibilities
  • RIE etching services combined with the grating patterning service

NFH Grating Foundry Services

Ibsen has worked extensively with NFH, and offers grating foundry services deploying NFH on our Suss MA6 NFH mask Aligner. NFH is especially applicable to patterning very short grating periods (200 nm -600 nm) over large areas. Contact us to discuss your requirements and our capabilities.

Grating SEM, Photoresist on Si, 350 nm period

Grating SEM, Photoresist on Si, 350 nm period

Grating SEM, Photoresist on SiO2, 1000 nm period

Grating SEM, Photoresist on SiO2, 1000 nm period

 

Holographic Stepper Grating Foundry Services

For patterning of grating chip areas on wafers, Ibsen has developed the proprietary holographic stepper patterning technology that is used for our own grating production. Ibsen offers grating foundry services on this technology. A couple of samples of gratings patterned in photoresist are shown above.

Further Information and Ordering

For further information or to request a quotation pleae contact us at phasemasks@ibsen.dk.